Investigating Sequential Vapor Infiltration Synthesis on Block-Copolymer-Templated Titania Nanoarrays

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Materials Research and Technology (MRT), Luxembourg Institute of Science and Technology (LIST), 41 rue du Brill, L-4422, Belvaux, Luxembourg
Institut de Chimie et Procédés pour l’Energie, l’Environnement et la Santé (ICPEES), UMR 7515 CNRS, Université de Strasbourg, 25 rue Becquerel, 67087 Strasbourg Cedex 2, France
§ Institut de Chimie, UMR 7177 CNRS, Université de Strasbourg, 1 rue Blaise Pascal, 67008 Strasbourg Cedex, France
International Center for Frontier Research in Chemistry (Fondation IcFRC), 8 allée Gaspard Monge, F-67000 Strasbourg, France
Cite this: J. Phys. Chem. C 2016, 120, 13, 7067–7076
Publication Date (Web):March 1, 2016
https://doi.org/10.1021/acs.jpcc.5b10415
Copyright © 2016 American Chemical Society
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Abstract

Sequential vapor infiltration synthesis (SVIS) within block-copolymer templates has emerged as an attractive means for the controlled formation of metal oxide nanoarrays on arbitrary substrates. This approach takes advantage of the molecular-level controls that are inherent in the production of the template and the exposure tools that are available for the vapor-phase growth of materials. To take adequate advantage of these controls and their dependencies on any environmental factors, it is essential to understand the mechanisms that govern nanostructure morphology at different stages of the growth process. To this end, this work correlates the evolution of the internal structure with the chemical functionality of block-copolymer templates in response to different conditions of exposure to volatile titania precursors. The evolution is followed by mapping structural and functional information at lateral and vertical resolutions down to a few nanometers through a combination of electron microscopies [scanning electron microscopy (SEM), transmission electron microscopy (TEM), cross sections], X-ray photoelectron spectroscopy (XPS), and secondary ion mass spectrometry (SIMS).

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The Supporting Information is available free of charge on the ACS Publications website at DOI: 10.1021/acs.jpcc.5b10415.

  • SEM and AFM images of BCP micelle films; quantitative XPS analysis of a sample exposed to 25 cycles in mode II; ALD calibration plot for TiO2 growth; quantitative XPS analysis; SIMS profile of a sample after 400 cycles in mode II; and comparison of Ti, Si, and O profiles after exposure to 200 and 400 cycles in mode I (PDF)

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  2. Ruben Z. Waldman, Nari Jeon, David J. Mandia, Olle Heinonen, Seth B. Darling, Alex B. F. Martinson. Sequential Infiltration Synthesis of Electronic Materials: Group 13 Oxides via Metal Alkyl Precursors. Chemistry of Materials 2019, 31 (14) , 5274-5285. https://doi.org/10.1021/acs.chemmater.9b01714
  3. Grant T. Hill, Dennis T. Lee, Philip S. Williams, Craig D. Needham, Erinn C. Dandley, Christopher J. Oldham, Gregory N. Parsons. Insight on the Sequential Vapor Infiltration Mechanisms of Trimethylaluminum with Poly(methyl methacrylate), Poly(vinylpyrrolidone), and Poly(acrylic acid). The Journal of Physical Chemistry C 2019, 123 (26) , 16146-16152. https://doi.org/10.1021/acs.jpcc.9b02153
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