Removal of Antibiotic Resistant Bacteria and Genes by UV-Assisted Electrochemical Oxidation on Degenerative TiO2 Nanotube Arrays
- Siwen Wang ,
- Shasha YangShasha YangDepartment of Civil and Environmental Engineering, Clarkson University, Potsdam, New York 13699, United StatesMore by Shasha Yang,
- Estefanny QuispeEstefanny QuispeDepartment of Civil and Environmental Engineering, Clarkson University, Potsdam, New York 13699, United StatesMore by Estefanny Quispe,
- Hannah YangHannah YangDivision of Biology and Biological Engineering, California Institute of Technology, Pasadena, California 91125, United StatesMore by Hannah Yang,
- Charles SanfiorenzoCharles SanfiorenzoDivision of Biology and Biological Engineering, California Institute of Technology, Pasadena, California 91125, United StatesMore by Charles Sanfiorenzo,
- Shane W. RogersShane W. RogersDepartment of Civil and Environmental Engineering, Clarkson University, Potsdam, New York 13699, United StatesMore by Shane W. Rogers,
- Kaihang WangKaihang WangDivision of Biology and Biological Engineering, California Institute of Technology, Pasadena, California 91125, United StatesMore by Kaihang Wang,
- Yang Yang* , and
- Michael R. Hoffmann*
Antibiotic resistance has become a global crisis in recent years, while wastewater treatment plants (WWTPs) have been identified as a significant source of both antibiotic resistant bacteria (ARB) and antibiotic resistance genes (ARGs). However, commonly used disinfectants have been shown to be ineffective for the elimination of ARGs. With the goal of upgrading the conventional UV disinfection unit with stronger capability to combat ARB and ARGs, we developed a UV-assisted electrochemical oxidation (UV-EO) process that employs blue TiO2 nanotube arrays (BNTAs) as photoanodes. Inactivation of tetracycline- and sulfamethoxazole-resistant E. coli along with degradation of the corresponding plasmid coded genes (tetA and sul1) is measured by plate counting on selective agar and qPCR, respectively. In comparison with UV254 irradiation alone, enhanced ARB inactivation and ARG degradation is achieved by UV-EO. Chloride significantly promotes the inactivation efficiency due to the electrochemical production of free chlorine and the subsequent UV/chlorine photoreactions. The fluence-based first-order kinetic rate coefficients of UV-EO in Cl– are larger than those of UV254 irradiation alone by a factor of 2.1–2.3 and 1.3–1.8 for the long and short target genes, respectively. The mechanism of plasmid DNA damage by different radical species is further explored using gel electrophoresis and computational kinetic modeling. The process can effectively eliminate ARB and ARGs in latrine wastewater, though the kinetics were retarded.
This article is cited by 3 publications.
- Yiwei Cai, Tong Sun, Guiying Li, Taicheng An. Traditional and Emerging Water Disinfection Technologies Challenging the Control of Antibiotic-Resistant Bacteria and Antibiotic Resistance Genes. ACS ES&T Engineering 2021, 1 (7) , 1046-1064. https://doi.org/10.1021/acsestengg.1c00110
- Yinghan Liu, Shuai Zhang, Hao Fang, Qilin Wang, Shan Jiang, Chenxi Zhang, Pengxiang Qiu. Inactivation of antibiotic resistant bacterium Escherichia coli by electrochemical disinfection on molybdenum carbide electrode. Chemosphere 2022, 287 , 132398. https://doi.org/10.1016/j.chemosphere.2021.132398
- Ying Huang, Yangyang Li, Minghao Kong, Dionysios D. Dionysiou, Lecheng Lei. Degradation of atrazine in the electrochemical LED-UV/Cl 2 system: the role of ˙OH and Cl˙. Environmental Science: Water Research & Technology 2021, 7 (9) , 1630-1642. https://doi.org/10.1039/D1EW00039J